Production of EUV Power with SECRAL

ZHAO HUAN-Yu; ZHAO Hong-Wei; SUN Liang-Ting; ZHANG Xue-Zhen; SHENG Liu-Si; TIAN Yang-Chao; ZHANG Guo-Bin

Chinese Physics C> 2007, Vol. 31> Issue(S1) : 229-231

Production of EUV Power with SECRAL

Institute of Modern Physics, Lanzhou 730000, China2 Graduate University of Chinese Academy of Sciences, Beijing 100049, China3 University of Sciences and Technology of China, Hefei 230026, China

Abstract
HTML
Reference
Related

PDF

Abstract：
The high power EUV source is one of key issues in the development of EUV lithography which is considered to be the most promising technology among the next generation lithography. However neither DPP nor LPP seems to meet the requirements of the commercial high-volume product. Insufficiency of DPP and LPP motivate the investigation of other means to produce the EUV radiation required in lithography. ECR plasma seems to be one of the alternatives. In order to investigate the feasibility of ECR plasma as a EUV light source, the EUV power emitted by SECRAL was measured. A EUV power of 1.03W in 4$\uppi$ sr solid angle was obtained when 2000W 18GHz rf power was launched, and the corresponding CE was 0.5%. Considering that SECRAL is designed to produce very high charge state ions, this very preliminary result is inspiring. Room-temperature ECR plasma and Sn plasma are both in the planned schedule.

References

[1]

. ITRS, 2005 Edition, Lithography2. Stamm U. J. Phys., 2004, D37: 32443. Bakshi V. EUV Source Workshop Summary and EUV Source Technology Status, SEMATECH EUV Source Workshop, San Jose, CA, USA, 27 Feb., 20054. Stamm U, Kleinschmidt J, K. Gael et al. EUV Source Development at XTREME Technologies an Update, SEMAT-ECH EUV Source Workshop, San Jose, CA, USA, 27 Feb.,20055. Furukawa H, Murakami M, KANG Y G et al. Estimations on Generation of High Energy Particle from LPP EUV Light Sources, 2004 EUVL Symposium6. Jonkers J. Plasma Sources Sci. Technol., 2006, 15: 87. Akira S. J. Plasma Fusion Res., 2003, 79: 3158. Krüken T, Bergmann K, Juschkin L et al. J. Phys., 2004,D37: 32139. Bernhardi K, Wiesemann K. Plasma Phys., 1982, 24: 86710. Girard A. Rev. Sci. Instr., 1992, 63: 267611. ZHAO H Y, ZHAO H W, MA XWet al. Rev. Sci. Instrum.,2006, 77: 03A31212. Barue C, Briand P, Girard A et al. Rev. Sci. Instr., 1992,63: 284413. Grüling P, Hollandt J, Ulm G. Nucl. Instr. and Meth. Phys.Res., 1999, A437: 15214. Merabet H, Kondagari S, Bruch R et al. Nucl. Instr. And Meth. Phys. Res., 2005, B241: 2315. Hitz D. 3rd International EUVL Symposium, 01-04 Nov.2004, Miyazaki, Japan16. ZHAO H W, WEI B W, LIU Z W et al. Rev. Sci. Instrum.,2000, 71: 646

[1]	CHEN Xiao-Fan . Test of Nonstatic Spherical Quark-Gluon Plasma by Two-Pion Interferometry. Chinese Physics C, 2007, 31(2): 173-176.
[2]	S.Biri , E.Fekete , I.Iván , I.Gál . Transformation of the ATOMKI-ECRIS into a Plasma Device. Chinese Physics C, 2007, 31(S1): 156-158.
[3]	A.V.Vodopyanov , S.V.Golubev , I.V.Izotov , V.I.Khizhnyak , D.A.Mansfeld , V.A.Skalyga , V.G.Zorin . ECR Plasma with 75 GHz Pumping. Chinese Physics C, 2007, 31(S1): 152-155.
[4]	ZHAO HUAN-Yu , ZHAO Hong-Wei , MA Xin-Weng , SUN Liang-Ting , ZHANG Xue-Zhen , LI Xi-Xia , WANG Hui , MA Bao-Hua , CAO Yun , FENG Yu-Cheng , ZHU Yu-Hua , SHANG Yong . Measurements of Bremsstrahlung Spectra on SECRAL. Chinese Physics C, 2007, 31(S1): 178-181.
[5]	SHENG Zheng-Ming , ZHANG Jie . Schemes for Electron Acceleration by Laser-driven Plasma Waves. Chinese Physics C, 2006, 30(S1): 153-155.
[6]	CHEN Xiao-Fan , YANG Xue-Dong , HAN Ling . Test of Quark-Gluon Plasma of Cylinder Shape by Two-Pion Interferometry. Chinese Physics C, 2006, 30(1): 44-46.
[7]	HUA Jian-Fei , AN Wei-Ming , HUANG Wen-Hui , TANG Chuan-Xiang , LIN Yu-Zheng , GU Yu-Qiu , LIU Hong-Jie , WANG Xiang-Xian , ZHOU Wei-Min , JIAO Chun-Ye , WEN Tian-Shu , HE Ying-Ling , , , , . A Preliminary Experiment of Plasma Electron Acceleration at SILEX-1. Chinese Physics C, 2006, 30(S1): 108-110.
[8]	Efaaf M , ZHANG Wei-Ning , Khaliliasr M , JIN En-Pei , LIU Yi-Ming . Pion Interferometry for Spherical Quark-Gluon Plasma Evolution Sources. Chinese Physics C, 2005, 29(1): 46-49.
[9]	Efaaf M.J. , ZHANG Wei-Ning , Khaliliasr M. , HUO Lei , JIN En-Pei , ZHANG Jing-Bo . Pion Interferometry for Cylindrical Quark-Gluon Plasma Evolution Sources. Chinese Physics C, 2005, 29(5): 467-471.
[10]	LIU Chang-Long . Effects of Hydrogen Plasma Treatment on Cavity Formation in Silicon Induced by He Ion Implantation. Chinese Physics C, 2005, 29(5): 524-529.
[11]	LIU Chang-Long . Effects of Si Ion Implantation and H Plasma Treatment on the Growth of Cavities in Silicon. Chinese Physics C, 2004, 28(9): 1013-1016.
[12]	LONG Jia-Li , HE Ze-Jun , JIANG Wei-Zhou , MA Yu-Gang , LIU Bo . Dileptons from a Chemically Non-equilibrated Quark-Gluon Plasma. Chinese Physics C, 2004, 28(4): 387-391.
[13]	ZHANG Han-Zhong , WANG En-Ke . Critical Behavior of Plasmon Damping Rate in Thermal Scalar Field. Chinese Physics C, 2002, 26(5): 522-529.
[14]	HE Ze-Jun , Zhou Wen-Jie , JIANG Wei-Zhou , ZHU Zhi-Yuan , LIU Bo . Enhancement of Dileptons with Intermediate Masses Produced in QGP. Chinese Physics C, 2001, 25(2): 179-182.
[15]	HE ZeJun , JIANG WeiZhou , ZHU ZhiYuan , LIU Bo , ZHANG JiaJu . A Signature for the Formation of the Quark-Gluon Plasma in Nucleus-Nucleus Collisions. Chinese Physics C, 2000, 24(5): 462-466.
[16]	Li Panlin , Wu Hua , Xu Mengjie . Dynamics of Phase Transition Including Quark-Fragment Effects foran Expansion Quark-Gluon Plasma. Chinese Physics C, 1997, 21(10): 918-925.
[17]	Hou Defu , Li Jiarong . On the Next to Leading Order Debye Screening Mass in QGP. Chinese Physics C, 1996, 20(6): 533-537.
[18]	Zhang Weining , Liu Yiming , Huo Lei , Jiang Yuzhen . Multiparticle Bose Correlations: Probes for Granular Source of Quark-Glunon-Plasma Droplets. Chinese Physics C, 1995, 19(2): 148-155.
[19]	Zhang Xiaofei , Li Jiarong . Calculation of Transport Coefficients for Colored Plasma Beyond the Abelian Dominance Approximation. Chinese Physics C, 1994, 18(11): 1043-1050.
[20]	XU Chun-Cheng , CAI Xu . Time Evolution of Colour Screening and Suppression of J/ψ、χ and ψ' by Quark-Gluon Plasma. Chinese Physics C, 1992, 16(1): 51-56.

Access

Get Citation

ZHAO HUAN-Yu, ZHAO Hong-Wei, SUN Liang-Ting, ZHANG Xue-Zhen, SHENG Liu-Si, TIAN Yang-Chao and ZHANG Guo-Bin. Production of EUV Power with SECRAL[J]. Chinese Physics C, 2007, 31(S1): 229-231.

ZHAO HUAN-Yu, ZHAO Hong-Wei, SUN Liang-Ting, ZHANG Xue-Zhen, SHENG Liu-Si, TIAN Yang-Chao and ZHANG Guo-Bin. Production of EUV Power with SECRAL[J]. Chinese Physics C, 2007, 31(S1): 229-231. shu

RIS(for EndNote,Reference Manager,ProCite)

BibTex

Txt

Milestone

Received: 2007-05-30
Revised: 1900-01-01

Article Metric

Article Views(3005)
PDF Downloads(627)
Cited by(0)

Policy on re-use

To reuse of subscription content published by CPC, the users need to request permission from CPC, unless the content was published under an Open Access license which automatically permits that type of reuse.

通讯作者: 陈斌, [email protected]

1.
沈阳化工大学材料科学与工程学院沈阳 110142

Production of EUV Power with SECRAL

Corresponding author: ZHAO HUAN-Yu,

Institute of Modern Physics, Lanzhou 730000, China2 Graduate University of Chinese Academy of Sciences, Beijing 100049, China3 University of Sciences and Technology of China, Hefei 230026, China

Received Date: 2007-05-30

Accepted Date: 1900-01-01

Available Online: 2007-01-03

Abstract: The high power EUV source is one of key issues in the development of EUV lithography which is considered to be the most promising technology among the next generation lithography. However neither DPP nor LPP seems to meet the requirements of the commercial high-volume product. Insufficiency of DPP and LPP motivate the investigation of other means to produce the EUV radiation required in lithography. ECR plasma seems to be one of the alternatives. In order to investigate the feasibility of ECR plasma as a EUV light source, the EUV power emitted by SECRAL was measured. A EUV power of 1.03W in 4$\uppi$ sr solid angle was obtained when 2000W 18GHz rf power was launched, and the corresponding CE was 0.5%. Considering that SECRAL is designed to produce very high charge state ions, this very preliminary result is inspiring. Room-temperature ECR plasma and Sn plasma are both in the planned schedule.

HTML

Reference (1)

Production of EUV Power with SECRAL

Abstract：

References

Access

Article Metrics

Metrics

通讯作者: 陈斌, [email protected]

Email This Article